“The challenges posed by next-generation EUV lithography demand breakthroughs in nanoscale patterning science and advanced tools and computing," says Jeff Neaton, Berkeley Lab's Interim Deputy Director for Research. The lab is excited to contribute its expertise and facilities to the pilot program.
We're partnering with @NY__Creates and @BerkeleyLab to speed up innovation and the manufacture of semiconductor chips.View quoted post on X
This program connects the microelectronics industry with world-class instruments and materials-science expertise from #NationalLabs. bnl.gov/newsroom/news.…
